The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 26, 1977
Filed:
Sep. 04, 1975
Applicant:
Inventors:
Lowell A Noble, Monte Sereno, CA (US);
Leonard N Grossman, Aptos, CA (US);
Mickey O Marlowe, Livermore, CA (US);
Assignee:
ILC Technology, Inc., Sunnyvale, CA (US);
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
C09K / ;
U.S. Cl.
CPC ...
156-2 ; 65 32 ; 252 791 ; 264 82 ;
Abstract
A process for polishing surfaces of sapphire or similar materials to remove surface imperfections visible at magnifications of 1,000X or higher regardless of the shape of the surface, is disclosed, which process comprises the steps of heating the material to an elevated temperature and exposing the surface to be polished to a static hydrogen environment.