The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 26, 1977
Filed:
Jul. 28, 1975
Kiyomi Sakurai, Neyagawa, JA;
Yasuyuki Takimoto, Takatsuki, JA;
Nippon Paint Co., Ltd., Osaka, JA;
Abstract
A process for formation of a relief image which comprises exposing a layer of a photosensitive composition in liquid provided on the surface of a support material to light through a negative to make cured the photosensitive composition at the exposed part and eliminating the non-cured photosensitive composition at the non-exposed part by suctioning for development, the photosensitive composition comprising as the essential components only (1) at least one addition polymerizable unsaturated monomer having at least one acryloyl or methacryloyl group per each molecule and a molecular weight of not more than about 1000 per each acryloyl or methacryloyl group and (2) at least one photopolymerization initiator.