The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 26, 1977
Filed:
Mar. 23, 1976
Edward Leonhardt Weiss, Quakertown, PA (US);
Leeds & Northrup Company, North Wales, PA (US);
Abstract
The far-field diffraction pattern produced by illuminating a collection of particles with a coherent light source is spatially modulated by a filter mask having a first aperture. The aperture is shaped to pass a total light flux proportional to a particular moment of the particle distribution over a certain particle size range. Light flux is passed by another aperture at greater or lesser radii and adjacent the first aperture. That flux is effectively subtracted from the flux passed by the first aperture as by subtracting the resulting signals produced by a photo detector at different times in response to the flux passed by the filter. The difference signal provides a measure of the particular moment within the same limits of accuracy but over a wider or narrower particle size range, respectively.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile