The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jul. 19, 1977

Filed:

Jun. 08, 1976
Applicant:
Inventors:

Gerald Allan Coquin, Berkeley Heights, NJ (US);

Juan Ramon Maldonado, Berkeley Heights, NJ (US);

Dan Maydan, Short Hills, NJ (US);

Sasson Roger Somekh, Berkeley Heights, NJ (US);

Assignee:
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
B01J / ; G02B / ; G21F / ;
U.S. Cl.
CPC ...
250505 ; 29579 ; 96 362 ; 250514 ;
Abstract

It has been observed that the deposition and patterning of metallic layers on a supported X-ray-transparent film to form a mask for X-ray lithography introduce stresses in the mask structure. In turn these stresses cause distortions of the film and of the high-resolution X-ray-absorptive pattern formed thereon. Various techniques, including new metallization systems, are proposed for minimizing the establishment of stresses in such structures.


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