The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 19, 1977
Filed:
Jun. 01, 1976
Bradford Clyde Schwartz, Longmont, CO (US);
Ralph Donald Silkensen, Longmont, CO (US);
Gerald Steving, Longmont, CO (US);
International Business Machines Corporation, Armonk, NY (US);
Abstract
An insulating film substantially free from surface irregularities is RF bias sputtered onto a smooth polycrystalline or micro-roughened surface. Controlled sputtering is performed first at a low reemission coefficient and then, after a substantially continuous layer of insulative amorphous film is deposited over the substrate, increasing the reemission coefficient to a second higher level. A low reemission coefficient is about 0.25 and a high coefficient is about 0.7.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile