The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jul. 19, 1977

Filed:

May. 13, 1976
Applicant:
Inventors:

Eugene David Feit, Berkeley Heights, NJ (US);

Newton Schwartz, Morristown, NJ (US);

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C25D / ; H01G / ;
U.S. Cl.
CPC ...
204 / ; 2041 / ; 361304 ; 361322 ;
Abstract

A technique is described for depositing organic layers down to a fraction of a monolayer thickness upon insulating substrates by non-vacuum deposition techniques which permit the subsequent deposition of mechanically stable adherent films of b.c.c. tantalum of low resistivity. The deposited films permit the fabrication of low cost, high frequency performance tantalum thin film capacitors.


Find Patent Forward Citations

Feit, Eugene. (1977). Technique for nucleating b.c.c. tantalum films on insulating substrates (U.S. Patent No. 4036708). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/4036708

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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