The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jul. 19, 1977

Filed:

Feb. 10, 1975
Applicant:
Inventors:

Pui Kum Lee, White Bear Lake, MN (US);

Wolfgang H Strehlow, Woodbury, MN (US);

Assignee:
Attorneys:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G02B / ;
U.S. Cl.
CPC ...
350 97 ; 350-35 ; 3501 / ;
Abstract

Retroreflective material including a medium containing a plurality of diffraction elements comprising light interference fringe patterns for enabling provision of a retroreflective effect upon light incident thereon. In making one embodiment a plurality of light interference fringe patterns defining an array of phase modulated fresnel zone plates is replicated by embossing at one surface of a copy medium having a thickness equal to a given focal length associated with the fresnel zone plates and a reflective material is coated on the opposite surface of the copy medium. In making other embodiments a plurality of fringe patterns is recorded throughout the volume of a photosensitive medium.


Find Patent Forward Citations

Loading…