The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 12, 1977
Filed:
Jul. 30, 1975
Michael Jay Lurie, East Brunswick, NJ (US);
RCA Corporation, New York, NY (US);
Abstract
A mask is used to sequentially illuminate successive elemental areas of an object (by changing the position of the mask) to obtain from each relatively small elemental area a diverging object-information component of coherent wave energy which is passed through a relatively large cross-sectional aperture of imaging and/or recording means. The fact that this cross-sectional aperture is so much larger in area than the area covered by any dust or optical defects of the imaging and/or recording means markedly reduces spurious coherent-wave patterns normally produced by such dust or optical defects. Further, since the illumination is not diffuse, no speckle pattern problem exists.