The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jun. 07, 1977

Filed:

Feb. 09, 1976
Applicant:
Inventors:

Robert Henry Collins, Wappingers Falls, NY (US);

Richard F Levine, Poughkeepsie, NY (US);

William D North, Poughkeepsie, NY (US);

Gerald D O'Rourke, Poughkeepsie, NY (US);

Gerald R Parker, Wappingers Falls, NY (US);

Assignee:

IBM Corporation, Armonk, NY (US);

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L / ;
U.S. Cl.
CPC ...
148187 ; 148188 ;
Abstract

A substantial increase in the reliability of metal-oxide-semiconductor field effect transistor (MOSFET) devices having a thin gate dielectric is achieved by providing a thin film of phosphosilicate glass (PSG) on the thin dielectric and completely covering the PSG layer with the gate metallization. The metallization extends over a thick film of phosphosilicate glass which is disposed on the thick insulator covering the source and drain regions.


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Collins, Robert. (1977). Method for making reliable mosfet device (U.S. Patent No. 4028150). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/4028150

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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