The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 07, 1977
Filed:
Nov. 07, 1975
Robert L Lamberts, Penfield, NY (US);
Nelson R Nail, Rochester, NY (US);
Eastman Kodak Company, Rochester, NY (US);
Abstract
An apparatus and method are disclosed by which a processed photosensitive material can be provided with a lenticular surface with each lenticule having a predetermined profile. The lenticules are arranged relative to one another with such a degree of accuracy that any speckle and scintillation that might be produced when the processed material is utilized as an element of a transmission or reflection type screen is reduced to a minimum, if not completely eliminated. Once the exposure factors for the emulsion have been established, the exposure profile can be determined for a particular lenticule profile to be imaged onto the photographic material or emulsion. The exposure profile can be utilized to provide a transparency master target pattern which can be of a relatively large size. After the master target has been exposed and developed or processed, the transparency is then placed in an optical system which minifies and projects the pattern on the target onto a photosensitive material in a predetermined and overlapping relation. After processing of the material, the lenticules are evident on the material which can then be used as an element of a rear or front projection type screen.