The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 31, 1977

Filed:

Nov. 17, 1975
Applicant:
Inventors:

Dennis C DeFevere, Palo Alto, CA (US);

Raymond Solomon, Sunnyvale, CA (US);

Assignee:

Hewlett-Packard Company, Palo Alto, CA (US);

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
B01D / ; B05C / ; B05C / ; H01L / ;
U.S. Cl.
CPC ...
118415 ; 2327 / ; 118423 ; 156422 ; 148172 ;
Abstract

A liquid phase epitaxial reactor is provided in which a simple cycling mechanism sequentially feeds semiconductor wafers from an input stack into a deposition region and thence to an output stack. In preferred embodiments, a cam is employed to tilt the output stack to accommodate the positioning of each successive wafer in the stack.


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