The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 24, 1977
Filed:
Aug. 07, 1975
Ronald F Cieciuch, Newton, MA (US);
Herbert N Schlein, Beverly, MA (US);
Polaroid Corporation, Cambridge, MA (US);
Abstract
Integral negative-positive patterns viewable without separation of the negative-positive components. Essential elements of such film units comprise a photosensitive system which after exposure and processing can provide a diffusion transfer image pattern, an image pattern receiving system and a reflection system integrated with the elements of the product so that after exposure and processing, the image pattern can be viewed as a reflection print. The image receiving system of the products of the present invention comprise a transparent support or dimensionally stable layer through which the image pattern can be viewed and the transparent support or layer is characterized in that a distinctive UV light absorption capability is integrated therewith. In the especially preferred products, the transparent layer or support additionally comprises a finely divided pigment dispersed therein which provides an effective anti-light piping capability without impairing to any substantial degree the transparency of the support or layer.