The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 19, 1977
Filed:
Jul. 28, 1975
Applicant:
Inventors:
Koichi Nagasawa, Amagasaki, JA;
Koichi Kijima, Itami, JA;
Assignee:
Mitsubishi Denki Kabushiki Kaisha, Tokyo, JA;
Primary Examiner:
Int. Cl.
CPC ...
C23C / ;
U.S. Cl.
CPC ...
118 491 ; 118-4 ;
Abstract
An apparatus for treatment of a semiconductor wafer comprises a sealable treating vessel which forms a sealed treating chamber in the vessel when sealed. A gas feeder feeds a compressed gas to the treating chamber. A heating device is disposed out of the treating chamber. The semiconductor wafer in the treating chamber is treated with the compressed gas while it is heated by the heating device.
Quick Actions:
Nagasawa, Koichi. (1977). Apparatus for treatment of semiconductor wafer (U.S. Patent No. 4018184). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/4018184
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile