The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 05, 1977
Filed:
Jun. 13, 1975
Jorn-Olaf Christian Weber, Wappingers Falls, NY (US);
Carl Yakubowski, Hyde Park, NY (US);
International Business Machines Corporation, Armonk, NY (US);
Abstract
A fluid application system which is useful for the subjection of substantially planar objects to various fluids for cleaning, etching, photoresist developing and the like. The system includes a chamber which has at least one agitation mechanism. The agitation mechanism includes an orificed plate positioned on one side of one or more of the planar objects. Means are provided for moving the fluid through the orificed plate with a pulsating motion. The agitation mechanism can either be substantially within the chamber or form one or more of the sides of the chamber. The agitation mechanism includes in addition to the orificed plate, a pneumatic chamber, a fluid chamber, a flexible diaphragm between the pneumatic and fluid chambers, and a piston being movable within the agitation mechanism to force the fluid through the orificed plate with the pulsating motion.