The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 22, 1977
Filed:
May. 19, 1975
Applicant:
Inventors:
Harry Louis Pinch, Princeton, NJ (US);
Herbert Irwin Moss, Yardley, PA (US);
Assignee:
RCA Corporation, New York, NY (US);
Attorneys:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G11B / ;
U.S. Cl.
CPC ...
358128 ; 2041 / ; 1791 / ; 1791 / ; 274 38 ;
Abstract
One end of a support structure of dielectric material tapers to a tip which has a curved bottom surface. A cermet film composed of a conductive material and a dielectric material which adheres well to the support structure is on a portion of the support structure's surface. The concentration of the constituent materials in the cermet film varies through its thickness. The cermet film at the interface with the support structure has a high concentration of dielectric material while the portion of cermet film at its exposed surface has a high conductive material concentration.