The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 22, 1977
Filed:
Nov. 01, 1974
Manfred R Kuehnle, Lexington, MA (US);
Coulter Information Systems, Inc., Bedford, MA (US);
Abstract
A method and apparatus for the deposition of a thin film on a substrate in which a length of the substrate such as for example, flexible plastic film, is transported in a path which follows along a convoluted configuration through a pressure vessel and therein is subjected to deposition effects. Such deposition effects, for example, comprise high frequency sputtering plasma. The helical path is arranged so that the substrate is carried through the influence of the deposition effects a plurality of times and at speeds which are much greater than those of known methods and apparatus. As a result, the deposition of the thin film is more uniform and a high throughput is achieved. Many other advantages are also achieved. In addition to conventional types of cooling, efficient cooling is obtained by magnetically sweeping secondary electrons away from the substrate. Batch and continuous processing are disclosed.