The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Mar. 22, 1977

Filed:

Oct. 14, 1975
Applicant:
Inventors:

Yoshikazu Ishii, Mito, JA;

Seizi Hattori, Tomobe, JA;

Nobuo Inagaki, Katsuta, JA;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
C23C / ; G11B / ;
U.S. Cl.
CPC ...
2041 / ; 360135 ;
Abstract

In the process of sputtering of an iron target in an atmosphere composed of a mixed gas containing a rare gas and oxygen, the oxygen partial pressure is regulated prior to both presputtering and main sputtering, by which ferromagnetic oxide Fe.sub.3 O.sub.4 is deposited on a substrate in one process. By setting the temperature of the substrate at 150.degree. to 250.degree. C, the coercive force and the squareness ratio of the oxide film is greatly enhanced. By using the oxide film as a medium of a magnetic disk storage, a magnetic recording and storage device of excellent characteristics can be obtained.


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