The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 22, 1977
Filed:
Mar. 24, 1976
Kenichi Nakamura, Tokyo, JA;
Haruko Kakutani, Tokyo, JA;
Kureha Kagaku Kogyo Kabushiki Kaisha, Tokyo, JA;
Abstract
The ion distribution in a high molecular film is controlled by selectively altering the ion pattern under a combination of heat and electric field where at least one of the latter is applied to the film in the desired pattern. Selectively altering the ion pattern is accomplished by any one of the following: lateral shifting of ions in one film, removal of ions from one film and concurrent injection into a second film; removal of ion disassociative molecules from one film and concurrent injection into a second film. Ions which color the film are preferably used to permit visual inspection of the ion pattern. The film with the ion pattern is particularly adapted for electro-photographic copying.