The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 15, 1977
Filed:
Aug. 26, 1975
Applicant:
Inventor:
Jan Roos, Eindhoven, NL;
Assignee:
U.S. Philips Corporation, New York, NY (US);
Attorneys:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H04N / ;
U.S. Cl.
CPC ...
358285 ; 310-81 ; 310-98 ; 332-3 ; 332 26 ;
Abstract
A device for scanning patterns, e.g. optical patterns, in which on the surface of a piezo-electric material Bleustein-waves are produced, while in the material or in a semi-conductor layer deposited on the surface a drift field is produced. Said drift field pulsates between two levels, a low level at which the gain of the surface wave is independent of the 'exposure' pattern and a high level at which the surface wave is locally amplified in accordance with the 'exposure' pattern.