The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 25, 1977
Filed:
Feb. 18, 1975
Applicant:
Inventors:
Jan Frans Van Besauw, Mortsel, BE;
Albert Lucien Poot, Kontich, BE;
Assignee:
AGFA-GEVAERT N.V., Mortsel, BE;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03C / ; G03C / ;
U.S. Cl.
CPC ...
96 58 ; 96 36 ; 96 383 ; 96 44 ; 96 8 / ; 96 8 / ;
Abstract
A photomask comprising a support that is transparent to ultra-violet radiation and visible light and a layer incorporating a photomask image, the image parts of which contain a complex compound of a silver halide and a diazonium, pyrylium, or thiapyrylium salt, wherein said complex compound is substantially opaque to ultra-violet radiation and blue light but substantially transmitting visible light in the wavelength range above 500 nm.
Van Besauw, Jan. (1977). Production of photomasks by forming complex of silver and diazonium or (U.S. Patent No. 4004925). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/4004925
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile