The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 04, 1977
Filed:
Sep. 03, 1974
Donald R Cone, Palo Alto, CA (US);
Nihon Denshi Kabushiki Kaisha, BOTH OF, JA;
Sharp Kabushiki Kaisha, BOTH OF, JA;
Abstract
A wideband beam exposure recording system including a recording beam directed along a path. An object mask having spaced apertures formed therein is positioned in the path of the beam to provide spaced and shaped beams along said path. Means is provided for selectively and independently controlling each of said beams as a function of the information to be recorded. A conductive plate lens having a single aperture formed therein is spaced from the object mask and the entrance of the aperture formed in said plate lens is positioned in the path of the spaced beams. A movable target, beam-sensitive surface is positioned adjacent the exit of the lens and voltage means is applied between the lens and the target for imaging the beams on the target in spaced relationship. The article provided by the recording system and method is also disclosed.