The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 04, 1977
Filed:
Dec. 09, 1974
Applicant:
Inventors:
Hans-Jurgen Rosenkranz, Krefeld, DT;
Hans Rudolph, Krefeld-Bochum, DT;
Erich Wolff, Leverkusen, DT;
Harald VON Rintelen, Leverkusen, DT;
Assignee:
AGFA-Gevaert, A.G., Leverkusen, DT;
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G03C / ; G03C / ;
U.S. Cl.
CPC ...
96 351 ; 9611 / ; 20415915 ; 20415922 ; 20415923 ;
Abstract
Relief or resist images can be produced by means of a photosensitive material including a photosensitive layer with a polymer as defined hereinafter containing vinyl groups capable of being cross-linked upon exposure to actinic light to yield unsoluble cross-linked products at the exposed areas while the polymer in the unexposed areas remain soluble.