The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Dec. 28, 1976

Filed:

Jul. 24, 1975
Applicant:
Inventors:

Robert E Hunt, China Lake, CA (US);

Kenneth L Moore, Ridgecrest, CA (US);

Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
G02B / ;
U.S. Cl.
CPC ...
33297 ; 350164 ; 428209 ;
Abstract

A method of producing an optical reticle and the reticle produced thereby. thin layer of aluminum is deposited on the face of a sapphire substrate and a reticle pattern is chemically etched therein. The system is then exposed to air at an elevated temperature for approximately one hour to oxidize the remaining aluminum layer. A film of titanium is next placed over the rough aluminum oxide as by sputtering, for example, and the excess titanium is etched away by the same pattern to produce the finished reticle.


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