The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Dec. 07, 1976

Filed:

May. 13, 1975
Applicant:
Inventors:

George E Keefe, Montrose, NY (US);

Yeong S Lin, Mount Kisco, NY (US);

Laurence L Rosier, San Jose, CA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G11C / ;
U.S. Cl.
CPC ...
3401 / ; 3401 / ;
Abstract

The undulating longitudinal edge of a continuous elongated structure of magnetic material forms a bubble domain propagation path for implementing the continuous movement of magnetic bubble domains under the control of a reorienting in-plane magnetic field. The domains propagate along the periphery of the undulating layer, with the periphery preferably taking the form of linked outwardly convex semi-circles. The structure can be comprised of a magnetically soft material, such as permalloy, or be an implanted region in the magnetic material which supports the bubble domains.


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