The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 23, 1976
Filed:
Dec. 24, 1975
Applicant:
Inventors:
Klaus Drews, Halstenbek, DT;
Jens-Peter Krumme, Hamburg, DT;
Assignee:
U.S. Philips Corporation, New York, NY (US);
Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
H01J / ;
U.S. Cl.
CPC ...
2504 / ; 250442 ;
Abstract
Substrate holder for etching thin films by means of an ion beam in which a driving device moves the surface of a substrate placed on a turntable with respect to the ion beam, which holder includes a friction disk which rotates in rolling contact with a surface of a driving disk carrying the turntable and is spaced from the axis of the driving disk by a distance equal to that at which the point of impact of the ion beam on the substrate is located.