The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 23, 1976
Filed:
Jan. 04, 1974
Takashi Kamiya, Suita, JA;
Yoshihisa Saito, Takarazuka, JA;
Tsutomu Teraji, Hirakata, JA;
Osamu Nakaguti, Osaka, JA;
Teruo Oku, Kyoto, JA;
Hitoshi Nakamura, Toyonaka, JA;
Masashi Hashimoto, Toyonaka, JA;
Fujisawa Pharmaceutical Co., Ltd., Osaka, JA;
Abstract
A process for producing a 2-cephem or 3-cephem derivative compound of the formula: ##SPC1## Wherein R.sub.1 represents a substituted or unsubstituted amino radical and R.sub.4 represents hydrogen or a radical selected from the group consisting of carboxy, protected carboxy, ester, acid amide, acid anhydride, acid halide, acid azide and carboxy salt, and the dotted line indicates the alternate bond structure providing 3-cephem or 2-cephem, which comprises: Reacting a halogenated derivative selected from the group consisting of a halogenated penam derivative having the formula: ##SPC2## A halogenated cepham derivative of the formula: ##SPC3## Wherein X represents a halogen atom, R.sub.3 represents a radical selected from the group consisting of carboxy, protected carboxy, ester, acid amide, acid anhydride, acid halide, acid azide and carboxy salt, and R.sub.1 is as defined above, or mixtures thereof with a dehydrohalogenoic acid reagent.