The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 02, 1976
Filed:
May. 13, 1975
Applicant:
Inventor:
Jacques Trotel, Paris, FR;
Assignee:
Thomson-CSF, Paris, FR;
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01J / ;
U.S. Cl.
CPC ...
3132313 ; 313360 ; 313153 ; 313162 ;
Abstract
An apparatus with an increased efficiency, for ion bombardment machining operations at voltages not exceeding some few thousands of volts, is provided. It comprises an ion source whose plasma is extracted across grids forming cylinders of revolution about one and the same axis, for example a vertical axis. The specimens for machining are arranged in a ring around the ion source. The ion beam, of radial type, is highly uniform within a cylindrical space defined between two parallel planes, for example horizontal planes. It is possible to limit the apertural angle of the beam by the use of a mask arranged against one of the grids.