The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 26, 1976
Filed:
Dec. 30, 1974
Akiyoshi Suzuki, Tokyo, JA;
Ichiro Kano, Yokohama, JA;
Canon Kabushiki Kaisha, , JA;
Abstract
In the apparatus, an image of a mask is printed on a light-sensitive layer while minimizing the debasing influences due to the diffraction occurring on the layer surface as well as due to the standing wave occurring in the layer. This apparatus includes an arrangement such that the rays coming from a light source are collimated and then directed to a fly's eye lens assembly, and the exit rays from this assembly are again collimated to illuminate the mask. The luminous fluxes of parallel rays impinging upon the mask at various angles of incidence remove the influences of diffraction on the image of the mask. Also this apparatus includes a filter removably inserted in the optical path between the light source and the assembly to remove the influence of the standing wave.