The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 26, 1976
Filed:
Oct. 17, 1974
Gilbert Eschard, Paris, FR;
Valere Dominique Duchenois, Paris, FR;
U.S. Philips Corporation, New York, NY (US);
Abstract
Method of manufacturing image display apparatus having a photocathode which is proximity focussed with respect to a micro-channel plate, comprising the steps of: positioning a photocathode substrate adjacent to the input face of a microchannel plate, the substrate having a surface facing the microchannel plate which may be altered by ion radiation bombardment; directing ion radiation from the channels of the microchannel plate by imposing a suitable voltage potential across the microchannel plate in a vacuum atmosphere to alter the surface of the substrate in a pattern of individual areas corresponding to the channels of the microchannel plate; forming a bowl-shaped photo-emissive recess at each of the altered individual areas; and spacing the substrate from the microchannel plate by a distance which results in each bowl-shaped photo-emissive recess being proximity focussed on the input aperture of the same channel that defined the individual area at which the bowl-shaped photo-emissive recess was formed.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile