The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 19, 1976
Filed:
Jul. 03, 1975
Applicant:
Inventor:
Joseph L Abita, Columbia, MD (US);
Assignee:
The United States of America as represented by the Secretary of the Navy, Washington, DC (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03C / ; G03C / ; B29C / ;
U.S. Cl.
CPC ...
96 383 ; 96 36 ; 96 362 ; 156-3 ; 156-8 ; 156 11 ; 355 75 ; 118504 ;
Abstract
The invention provides a method for making a relief mask used for pattern neration in planar thin film overlays, which relief mask is structurally formed to produce intimate contact between a photoresist surface and a masking pattern during exposure of the photoresist surface. The present method comprises the steps of: