The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 12, 1976
Filed:
Jan. 23, 1975
Masakazu Fukai, Nishinomiya, JA;
Shinji Fujiwara, Toyonaka, JA;
Hiroyuki Serizawa, Katano, JA;
Osamaru Eguchi, Higashi-Osaka, JA;
Yukimasa Kuramoto, Takarazuka, JA;
Matsushita Electric Industrial Co., Ltd., Osaka, JA;
Abstract
A target for an image pickup tube having high sensitivity, low dark current and low amount of lag-image is manufactured by forming a hetero-junction by the evaporation process. A first layer of ZnS.sub.x Se.sub.1.sub.-x or Zn.sub.u Cd.sub.1.sub.-u S (wherein 0 .ltoreq. x .ltoreq. 1 and 0 .ltoreq. u .ltoreq. 1) is deposited on a light transmitting substrate having a coefficient of linear expansion of 56 .times. 10.sup..sup.-7 /.degree.C - 110 .times. 10.sup..sup.-7 /.degree.C and a second layer of (Zn.sub.y Cd.sub.1.sub.-y Te).sub.z (In.sub.2 Te.sub.3).sub.1.sub.-z (wherein 0.1 .ltoreq. y .ltoreq. 0.9 and 0.7 .ltoreq. z .ltoreq. 1) is deposited on the first layer. The substrate is then heat treated in an inert gas atmosphere or under vacuum at a temperature of 350.degree.-650.degree.C, preferably 500.degree.-600.degree.C for a time period of 5-90 minutes, preferably 5-15 minutes. By effecting second heat treatment at a temperature lower than the first heat treatment temperature, preferably at a temperature of 150.degree.-400.degree.C for 20 minutes - 3 hours, the characteristics of the target are further improved.