The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 12, 1976

Filed:

Aug. 15, 1975
Applicant:
Inventor:

Horst Kiemle, Neuried, DT;

Assignee:

Siemens Aktiengesellschaft, Berlin & Munich, DT;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03B / ;
U.S. Cl.
CPC ...
355 46 ; 346 / ; 354-4 ; 354118 ; 355-2 ;
Abstract

A device for electro-optically, computer-controlled drawing of a plurality of mask patterns in a layer of light sensitive material disposed on a plane of a mask carrier characterized by a source of coherent light, a modulator for modulating the coherent light, a light detector for imposing a row-by-row scanning motion on the beam of light, an objective device for projecting the beam onto a layer of the light sensitive material, optical lenses arranged between the light deflector and the objective device for imaging the output plane of the light deflector onto a plane of the objective which includes an objective lens arrangement for focusing the beam and a multiplier hologram for splitting up the focused beam emerging from the objective lens arrangement into a plurality of identical sub-beams directed in different directions so that the plurality of spaced identical mask patterns are simultaneously formed in a light sensitive layer. Preferably, the device includes an immersion means such as a glass body which is disposed between the objective device and the plane of the mask carrier.


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