The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 05, 1976

Filed:

Jan. 03, 1975
Applicant:
Inventors:

Yutaka Misawa, Hitachi, JA;

Hideyuki Yagi, Hitachi, JA;

Yasumichi Yasuda, Hitachi, JA;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L / ;
U.S. Cl.
CPC ...
357 55 ; 357 13 ; 357 38 ; 357 52 ; 357 56 ;
Abstract

In a high-withstand-voltage (high-breakdown voltage) semiconductor device in which the main PN junction is of planar structure and a field limiting ring region is provided outside and around the exposed end of the main PN junction, a groove is formed between the main region to form the main PN junction and the field limiting ring region, the bottom of which groove is shallower than that of each of the regions and in the surface of which groove the end of the main PN junction and one of the ends of the PN junction between the field limiting ring region and the substrate are exposed, and the other end of the PN junction between the field limiting ring region and the substrate is exposed in the surface of another groove whose bottom is deeper than that of the field limiting ring region.


Find Patent Forward Citations

Loading…