The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 03, 1976

Filed:

Dec. 13, 1974
Applicant:
Inventors:

Jean-Pierre Schirmann, Brignais, FR;

Francis Weiss, Pierre-Benite, FR;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C07C / ;
U.S. Cl.
CPC ...
2602 / ; 2605 / ; 2605 / ; 2605 / ; 260508 ; 260509 ; 260510 ; 2605 / ; 2605 / ; 2605 / ; 2605 / ; 260519 ; 2605 / ; 2605 / ; 2605 / ; 2605 / ; 2605 / ; 2605 / ; 2605 / ;
Abstract

A process is disclosed for the preparation of symmetrical azines of the formulas ##EQU1## and unsymmetrical azines of the formulas ##EQU2## and mixtures of azines (I), (II), and (IV), and (I), (III) and (V), wherein R.sup.1 , R.sup.2, R.sup.3 and R.sup.4 each is hydrogen, a straight-chain alkyl radical of from 1 to 12 carbon atoms, a branched-chain alkyl radical or a cycloalkyl radical of from 3 to 12 carbon atoms or a phenyl radical, the aforesaid radicals being unsubstituted or substituted with a radical which is stable in the medium in which said azines are produced; and in which case R.sup.1 and R.sup.2 can be the same or different radicals, R.sup.3 is a radical different from R.sup.1 and R.sup.2, R.sup.3 and R.sup. 4 are radicals different from each other, and each are different radicals from R.sup.1 and R.sup.2 ; or R.sup.1 and R.sup.2 or R.sup.1 and R.sup.3, or R.sup. 3 and R.sup.4 of either or both the >C=N-- moieties together form a cyclic or substituted cyclic radicals of from 3 to 11 carbon atoms in the ring.


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