The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jun. 29, 1976

Filed:

Mar. 03, 1975
Applicant:
Inventor:

Edward A Heighway, Deep River, CA;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01F / ;
U.S. Cl.
CPC ...
335210 ; 313361 ;
Abstract

The magnetic beam deflector system of this invention consists of two identical mirror image sections positioned about a symmetry plane. The sections are energized such that the zeroth order beam path through one section is a mirror image of the beam path through the other section resulting in a beam exit axis which is symmetrically located on one side of the symmetry plane with respect to the entry axis on the other side. In a 180.degree. deflector system, the entry and exit axes are coincident and lie in the symmetry plane. The preferred embodiment consists of four dipole magnets, forming a 180.degree. deflector system symmetrical about a symmetry plane in which the zeroth order beam path is defined by:


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