The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 29, 1976
Filed:
Dec. 10, 1973
Tatsuo Tomioka, Tokyo, JA;
Yasuo Hoshide, Okegawa, JA;
Hirosi Ogawa, Ageo, JA;
Kenichi Suzuki, Funabashi, JA;
Nikken Chemicals Co., Ltd., Tokyo, JA;
Abstract
A process for producing a desacetoxy cephalosporanic acid represented by formula (III), ##SPC1## wherein R.sub.1 is acyl, and R.sub.2 is alkyl, aryl or arylalkyl, which comprises: heating a penicillin sulfoxide of the formula (I), ##SPC2## wherein R.sub.1 and R.sub.2 are the same as hereinbefore defined at 50.degree. to 160.degree.C in an inert organic solvent in the presence of a sulfonate represented by formula (II), ##EQU1## wherein A is R.sub.5 --N--R.sub.6, R.sub.5 --N--O--R.sub.6, S--R.sub.6, R.sub.5 --S.fwdarw.O, and R.sub.3, R.sub.4, R.sub.5 and R.sub.6 are lower alkyl, phenyl, benzyl or phenethyl, R.sub.7 is 1-12C alkyl, phenyl, 1-12C alkyl-substituted-phenyl, naphthyl, 1-12C alkyl-substituted naphthyl, halogen-substituted phenyl and wherein when A is R.sub.5 --N--R.sub.6 or R.sub.5 --N--O--R.sub.6, R.sub.3, R.sub.4 and R.sub.5 may form a heterocyclic ring together with the nitrogen atom, and when A is S--R.sub.6, R.sub.3 and R.sub.4 may form a heterocyclic 4-5C polymethylene ring or R.sub.6 and R.sub.7 may bond to form a polymethylene link.