The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jun. 29, 1976

Filed:

Jul. 03, 1974
Applicant:
Inventor:

Robert C Patzke, Prospect Heights, IL (US);

Assignee:
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G03B / ;
U.S. Cl.
CPC ...
355121 ; 355115 ; 355120 ;
Abstract

An exposure system for a microfiche duplicating machine includes a mercury vapor light source and a light transparent platen disposed above the light source for supporting an original microfiche card and a duplicating film card for exposure by the light source. A shutter mechanism is interposed between the light source and the transparent platen to control the exposure of the duplicating film card, and a cover is disposed over the transparent platen to prevent the escape of light from the duplicating machine during the exposure. A mechanical linkage is provided for automatically opening a pair of shutters within the shutter mechanism upon the closing of the cover to initiate the exposure of the duplicating film card. Simultaneously, a timer is energized by the closing of the cover to initiate an exposure timing sequence. Upon completion of the timing sequence, a timer energized by a solenoid actuator releases the cover, and the shutters are automatically closed by the mechanical linkage to terminate the exposure.


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