The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 22, 1976
Filed:
Sep. 02, 1975
Dana G Marsh, Rochester, NY (US);
Xerox Corporation, Stamford, CT (US);
Abstract
Disclosed is a method for the preparation of a relief printing master which is based on irradiation of a film of a composition comprising A. a degradable polymer containing segments characterized by the structural formula ##EQU1## wherein R is H, an alkyl radical of 1 to 6 carbon atoms, a chlorine or fluorine substituted alkyl radical of 1 to 6 carbon atoms or a cyano substituted aliphatic hydrocarbon radical of 1 to 5 carbon atoms, and B. a photosensitizer which upon exposure to actinic radiation assumes a .sup.3 (n, .pi.*) or a .sup.1 (n, .pi.*) state. The polymer and photosensitizer combination, which is in the form of a thin film upon a suitable substrate, is exposed in an imagewise manner to actinic radiation to thereby degrade the polymer. Upon such degradation, depressions are formed in the exposed areas thereby rendering the exposed film suitable for use as a relief printing master.