The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jun. 15, 1976

Filed:

Dec. 17, 1974
Applicant:
Inventors:

Bernard M Kemlage, Kingston, NY (US);

Jerry M Woodall, Saratoga, CA (US);

William C Wuestenhoefer, Mahopac, NY (US);

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L / ; H01L / ;
U.S. Cl.
CPC ...
148175 ; 156610 ; 156612 ; 156613 ; 156614 ; 357 16 ; 357 17 ; 357 60 ; 357 88 ;
Abstract

A process for producing light emitting diodes is disclosed. In the process a primer layer of GaP is pyrolytically deposited on a Si substrate with the resulting epitaxial film thickness being sufficient to form complete coalescence of the epitaxial nuclei, but thin enough to avoid cracks in the epitaxial layer due to stress induced by thermal expansion. The thickness is generally between 1-2.mu. . A second layer of GaP is then deposited using the standard halide transport process with thicknesses of 10-20.mu. with the graded addition of AsH.sub.3, until the particularly desired design composition of GaAsP is obtained. A constant layer of GaAsP is grown on the graded layer.


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