The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 08, 1976
Filed:
Nov. 20, 1972
Applicant:
Inventor:
Larry D Rich, St. Paul, MN (US);
Assignee:
Minnesota Mining and Manufacturing Company, St. Paul, MN (US);
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G03C / ;
U.S. Cl.
CPC ...
96 83 ; 96 364 ; 96 8 / ; 96 8 / ; 96 362 ; 96 33 ; 9611 / ;
Abstract
A positive and negative developable photosensitive composition including a photopolymerizable monomer, photoinitiator, and a blend of polymers, one an acid soluble amino containing polymer, the other a compatible, acid insoluble, film-forming, polymer. The composition, which can be developed positively with dilute aqueous acid or negatively with dilute base, is useful in silk screen printing and as a photoresist composition in general.
Rich, Larry. (1976). Positive or negative developable photosensitive composition (U.S. Patent No. 3961961). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/3961961
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile