The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 04, 1976

Filed:

Dec. 30, 1974
Applicant:
Inventors:

Harsaran Singh Bhatia, Wappingers Falls, NY (US);

Gerald Dennis O'Rourke, Poughkeepsie, NY (US);

Siegfried K Wiedmann, Stuttgart, DT;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L / ;
U.S. Cl.
CPC ...
357 42 ; 357 43 ; 357 48 ; 357 52 ; 357 86 ;
Abstract

A complementary field effect transistor structure which eliminates the problems caused by parasitic currents between devices. The currents are contained within parasitic bipolar devices formed between the various regions of the FETs. A portion of the collector current of the parasitic bipolar devices is drained away so that the loop gain is less than one. This is achieved by placing guard regions of conductivity type which are the same as the channel type of the transistors adjacent said regions. The guard region is preferably in the form of a continuous ring around its associated FET.


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Bhatia, Harsaran. (1976). Elimination of scr structure (U.S. Patent No. 3955210). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/3955210

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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