The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 04, 1976
Filed:
Oct. 19, 1973
Manfred Roschy, Munich, DT;
Alois Schauer, Grunwald, DT;
Siemens Aktiengesellschaft, Berlin & Munich, DT;
Abstract
Al-Ta alloy films containing 2 to 20 atomic % of Ta in Al exhibit an improved temperature stability. An Al-alloy film containing 7 atomic % of Ta has a resistivity of 60.mu..OMEGA. cm, a temperature coefficient of resistance of +100 ppm.degree./K and a sparking potential of about 400 V when anodizing in 0.1% H.sub.3 PO.sub.4. An Al-alloy film containing 15 atomic % of Ta has a specific resistance of 200.mu..OMEGA. cm, a temperature coefficient of resistance of -100 ppm.degree./K and a sparking potential of about 300 V when anodizing in 0.1% H.sub.3 PO.sub.4. The alloy films are applied on a non-conductive substrate, as by RF-cathode sputtering in a desired thickness and are useful for thin-film circuits, discrete resistors, capacitors, etc.