The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Apr. 27, 1976

Filed:

Oct. 18, 1973
Applicant:
Inventors:

Keizo Hosoi, Tokyo, JA;

Hiroshi Sagami, Shiki, JA;

Isao Imai, Niiza, JA;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C08F / ; C08F / ;
U.S. Cl.
CPC ...
260836 ; 260861 ; 260867 ; 260873 ; 260901 ; 526 15 ; 526 16 ; 526 55 ; 526273 ; 526320 ; 526324 ; 526325 ; 526329 ; 526330 ; 526342 ; 526347 ;
Abstract

Addition polymerizable polymeric compounds produced by esterification reaction or addition reaction of a copolymer having pendent carboxyl groups and about 0.03 to 1.0 equivalent, based upon the carboxyl groups of said copolymer, of an ethylenically unsaturated compound having one oxirane ring, said copolymer being obtained by copolymerizing (1) about 10 to 95 percent by weight of at least one member selected from the group consisting of styrene and the methyl-substituted styrene derivatives (2) about 5 to 70 percent by weight of at least one ethylenically unsaturated mono- or di-carboxylic acid, its anhydride or its monoalkyl of 1 to 4 carbon atoms ester, (3) up to about 30 percent weight of at least one member selected from the group consisting of acrylonitrile and methacrylonitrile, (4) up to about 85 percent by weight of at least one compound of the formula ##EQU1## wherein R.sup.1 represents a hydrogen atom or methyl group; and R.sup.2 represents an alkyl group having 1 to 12 carbon atoms, and (5) up to about 50 percent by weight, based upon the total weight of said compound (3) and/or (4), of at least one vinyl ester of a saturated aliphatic mono-carboxylic acid having 2 to 10 carbon atoms, and photopolymerizable compositions comprising (A) about 100 parts by weight of the above-described addition polymerizable polymeric compound, (B) about 5 to 70 parts by weight of at least one ethylenically unsaturated compound and (C) about 0.0001 to 10 parts by weight of a photopolymerization initiator. The compositions give photopolymerizable elements which are useful for various pattern or image yielding purposes and especially useful in making reliefs, particularly lithographic plates having an excellent printing durability.


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