The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 20, 1976
Filed:
Feb. 28, 1974
Applicant:
Inventor:
Adir Jacob, Framingham, MA (US);
Assignee:
LFE Corporation, Waltham, MA (US);
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
B29C / ; C23F / ; C09K / ;
U.S. Cl.
CPC ...
156-8 ; 204164 ; 252 792 ;
Abstract
A process step and material for use in the manufacture of semiconductor photomasks. To facilitate the etching of unmasked chromium, gold, and other metals capable of forming oxychloride derivatives on preselected portions of a substrate material, the material is exposed to a low pressure rf generated 'cold' plasma (under 300.degree.C) produced from a homogeneous gaseous mixture of oxygen and a halogen containing compound.