The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 20, 1976
Filed:
Aug. 20, 1974
Applicant:
Inventor:
Alain Gerard Monfret, Echirolles, FR;
Assignee:
U.S. Philips Corporation, New York, NY (US);
Attorneys:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L / ;
U.S. Cl.
CPC ...
148-15 ; 29578 ; 156 17 ; 357-9 ; 357 91 ; 148187 ;
Abstract
A method of manufacturing a semiconductor device by means of doping via a mask. According to the invention a mask is used which is manufactured by providing one or more 'first' apertures in a masking layer, after which islands of an isotropically growing material are grown in the said apertures, after which the parts of the masking layer present between the islands are removed and finally the said islands themselves are removed.
Monfret, Alain. (1976). Method of manufacturing a semiconductor device and device manufactured (U.S. Patent No. 3951694). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/3951694
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile