The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 20, 1976
Filed:
Dec. 09, 1974
Joseph L Abita, Columbia, MD (US);
Jack G Bebee, Derwood, MD (US);
The United States of America as represented by the Secretary of the Navy, Washington, DC (US);
Abstract
A method for preparing the surface of a glass substrate so that resist maial may be directly applied to the surface and adhere thereto. The invention is particularly useful in the fabrication of relief masks used for pattern generation in planar thin film overlays, which masks are used to provide intimate contact between a photoresist surface and a masking pattern during exposure of the photoresist surface. The present method comprises cleaning of the glass substrate, boiling the substrate in trichloroethylene, and heating the substrate to between 160.degree. and 200.degree.C. Resist material may then be applied directly to the glass substrate.