The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 13, 1976
Filed:
Jan. 29, 1975
Applicant:
Inventors:
Edwin T Sortwell, Wheaton, IL (US);
David S Kerr, Wheaton, IL (US);
Assignee:
Nalco Chemical Company, Oak Brook, IL (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B05B / ;
U.S. Cl.
CPC ...
239 70 ; 239112 ; 239127 ; 239176 ;
Abstract
System for handling and applying a non-suspended refractory slurry to ingot stools used in the production of steel ingots, including an apparatus capable of selectively applying refractory slurry to ingot stools which receives slurry from a storage tank. An agitator is provided in the tank to continually agitate the slurry, and wet air is used to clean the lines carrying the slurry when they are not being used for application of slurry to prevent clogging.
Quick Actions:
Sortwell, Edwin. (1976). System for handling and applying a non-suspended refractory slurry (U.S. Patent No. 3949937). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/3949937
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile