The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 06, 1976
Filed:
May. 14, 1973
John J Bergstrom, Cedar Falls, IA (US);
Chamberlain Manufacturing Corporation, Waterloo, IA (US);
Abstract
Method and apparatus for improving the behind-the-targets effects of shaped charge munitions which provides a secondary target defeating mechanism which follows through the opening formed by the high velocity jet which perforates the target. The shaped charge liner may be axially symmetrical in the form of a cone or section of a sphere and behind the apex is mounted the follow through secondary target defeating mechanism which is surrounded by the explosive charge. When the charge is ignited the resulting detonation wave collapses the liner into a high velocity jet or slug that perforates the target after which the follow-through agent is driven through the perforation. The follow-through agent may be pyrophoric or ignitable and such agents will increase the temperature and pressure particularly if the target is a closed target. Other materials may be used and introduced into the target through the perforation.