The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Apr. 06, 1976

Filed:

Jul. 03, 1974
Applicant:
Inventors:

Adrien Leroux, Sherbrooke, CA;

Alexandre Kocsis, Sherbrooke, CA;

George D Lane, Muncy, NY (US);

Assignee:
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H05K / ;
U.S. Cl.
CPC ...
29625 ; 156 89 ; 174 685 ; 264 61 ; 3171 / ;
Abstract

A method and process of screening multilayer thick-film structures to produce complex hybrid electronic circuits. After deposition, drying and firing of the first conductor plane on the substrate, registration ink is deposited and allowed to dry thus forming temporary vias. A suitable dielectric paste is then deposited either on all the surface or except on viaslocations. The dielectric paste is then dried and fired. Firing however causes sublimation or evaporation of the temporary vias pattern leaving cavities in the dielectric layer. Slight buffing may be required to uncover the via holes. The vias and the second conductor plane are then deposited, dried and fired. The same steps are carried out for each subsequent conductor plane.


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