The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 23, 1976
Filed:
Jul. 08, 1974
Friedrich Forster, Dortmund-Wellinghofen, DT;
Erich Barth, Dortmund, DT;
Heinz-Jochen Keller, Dortmund-Horde, DT;
Friedrich Uhde GmbH, Dortmund, DT;
Abstract
A method for the production of a homogenous gas mixture from two gas streams of different parameters in which an open or free equalizing space downstream of a superimposed catalyst layer is provided. Within such open space is a mixing assembly imposing a little deflection upon the reaction gas stream causing a low pressure drop in the stream with a consequent reduced loss of energy. Quench gas is admitted through a two stage pressure reduction. It is first expanded from a duct surrounding the mixing assembly through a plurality of openings where the gas velocities are reduced and equalized. The second pressure reduction takes place across openings in the mixing assembly. Quench gas and reaction gas are then thoroughly mixed in the mixing assembly and the gas mixture is consequently passed to the entrance of a second catalyst layer downstream.